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| VIISta® PLAD |
| Varian Semiconductor is the leader in plasma doping, the only plasma doping supplier in mass production. |
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The VIISta PLAD provides:
- Required device performance without substrate etching or damage
- Industry leading dose retention and uniformity
- Broad process window with accurate doping profile
- Minimized production risk with in-situ dose control
The VIISta PLAD features:
- High density, low energy plasma – high productivity, no substrate etching or damage
- Advanced RF technology provides unique deposition control
- Pulsed DC bias provides accurate energy, depth, and dose control with wide process window
- Variable duty factor provides process flexibility
- Closed loop faraday system provides secure process protection for mass production
Our plasma doping systems are based on a common platform, providing customers with flexibility in managing overall bay productivity, resulting in:
- Decreased time to first silicon
- Greater productivity across all applications
- Highest industry throughput
- Cost-effective training
- Increased return on investment
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