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Varian Solion delivers superior cell performance and yield using the industry benchmark, dual-magnet ribbon beam implant architecture. Our patented Precision Patterned Implant simplifies the process flow to make the Varian Solion the most cost-effective system for creating high efficiency solar cells. Its outstanding within wafer uniformity and wafer-to-wafer repeatability provides the tightest binning possible for solar cells. More importantly, Precision Patterned Implant technology provides a path to advanced cell structures with continuous improvement in cell efficiency. Solion is part of Varian’s ion implant portfolio and is supported by a highly recognized worldwide service network.
Key Benefits
- Enables the manufacture of high efficiency silicon solar cells through superior P-N junction formation
- Lowers cost per watt through process simplification by eliminating PSG clean and edge isolation steps
- Precision Patterned Implant (PPI) provides in-situ patterned dopant without adding cost
- The only technology that is extendable to support advanced solar cell structures
- Highly recognized worldwide service and support network
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